AlCl<sub>3</sub>-Dosed Si(100)-2 × 1: Adsorbates, Chlorinated Al Chains, and Incorporated Al
نویسندگان
چکیده
The adsorption of AlCl3 on Si(100) and the effect annealing AlCl3-dosed substrate were studied to reveal key surface processes for development atomic-precision, acceptor-doping techniques. This investigation was performed via scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), density functional theory (DFT) calculations. At room temperature, readily adsorbed Si dimers dissociated form a variety species. Annealing at temperatures below 450 °C produced unique chlorinated aluminum chains (CACs) elongated along dimer row direction. An atomic model is proposed with supporting DFT Al incorporated into upon above, Cl desorption observed beyond °C. Al-incorporated samples encapsulated in characterized by secondary ion mass spectrometry (SIMS) depth profiling quantify atom concentration, which found be excess 1020 cm–3 across ∼2.7 nm-thick δ-doped region. concentration achieved here processing parameters utilized promote as viable gaseous precursor novel acceptor-doped materials devices quantum computing.
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ژورنال
عنوان ژورنال: Journal of Physical Chemistry C
سال: 2021
ISSN: ['1932-7455', '1932-7447']
DOI: https://doi.org/10.1021/acs.jpcc.1c00691